A solution to the Data Storage Problems - New memory device with excellent Switching Characteristics and Low-power requirements

A memory device with excellent switching characteristics and low-power requirements for data storage applications, has been developed by Indian scientists. It can fill the lacuna and provide high-performance, and high-density memories with low power requirements for data storage.

A solution to the Data Storage Problems - New memory device with excellent Switching Characteristics and Low-power requirements

In today's data intensive world, an efficient and durable data storage solution is necessary for building a stable foundation for the upcoming enterprises that will rely heavily on Data Analytics. But some problems lies before us, ranging from infrastructure and effective costing to data security, UI and accessibility, compatibility and others. Therefore, there is a consistent effort on innovating new and better solutions for these persistent problems of data storage.

Resistive memory devices with switching characteristics can provide high-performance and high-density memories with low power requirements. Nonetheless these devices face several technical challenges and are not yet ready for commercialization. However the recent developments of Ms. Swathi S. P. and Dr. S. Angappane from the Centre for Nano and Soft Matter Sciences (CeNS), Bangalore, an autonomous institution of the Department of Science and Technology, Govt. of India (DST), can be the next big step towards an effective solution for our data storage problems.

They have created a low-power memory device with excellent switching properties made from the chemical hafnium oxide, a replacement for silicon oxide, for data storage applications. As an insulating layer, they have employed a material called hafnium oxide (HfO2), which may become polarised when electric current is applied. They prepared it using a technique known as sputtering deposition method. It is a physical vapour deposition process in which the intended 'target' material's atoms or molecules are knocked off using energetic ions and then deposited onto a substrate. By adjusting the growth temperature and annealing conditions, which involve altering a material's physical and occasionally chemical properties to increase ductility and decrease hardness to make it more workable, the resistive switching qualities of the HfO2 film might be further improved.

This research can lead to commercial development of the gadgets, as it has showed stronger endurance and greater retention and performed much better, than the previous ones. It may also help in the future creation of resistive memory systems that are more effective, practical, non-volatile and dependable. These resistive memory devices are being reduced in size by the CeNS researchers, to make it more ergonomic. In order to maximise the memory device's multifunctional possibilities, the team is examining brain-inspired functionalities in it as well as the potential for merging it with other potential sensors. It opens up other arenas of research to come up with an economic and effective solution for data storage.

What's Your Reaction?

like
2
dislike
0
love
0
funny
0
angry
0
sad
0
wow
1